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Vol. 113, Issue 2, February 2010, pp. 107-114




Influence of Firing Temperature on Compositional and Structural Characteristics of ZrO2 Thick Films Gas Sensor



1Department of Physics, M.S.G. College, Malegaon Camp, Dist- Nasik, Maharashtra, India

Thin and Thick Film Laboratory, Department of Electronic Science, M.S.G. College, Malegaon Camp, Dist- Nasik, (M.S.), India

2Department of Electronic science, L. V. H. College, Panchavati, Nasik (M.S.), India

* Tel.: +91-9420228393,

E-mail: sunilbapupatil@gmail.com



Received: 17 December 2010   /Accepted: 19 February 2010   /Published: 26 February 2010


Abstract: In this paper, we explore for the first time the compositional, morphological and structural properties of the ZrO2 thick films prepared by standard screen printing method and fired between 800 oC to 1000 oC for 2-hours in an air atmosphere. The material characterization was done by using XRD, X-ray energy dispersive analysis (EDAX), and scanning electron microscope (SEM). The deposited films were polycrystalline in nature. Also samples were found uniform and adherent to the alumina substrate. Effect of firing temperature on structural parameters such as grain size and surface area were calculated. The result indicates that grain growth can be increased by increasing firing temperature which is responsible for decreasing surface area. From the EDAX analysis it was found that the ZrO2 films are non- stoichiometric in nature which is due to semiconducting behavior of the films.


Keywords: ZrO2, Thick films, XRD, EDAX, SEM


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