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Vol. 113, Issue 2, February 2010, pp. 150-157




Heat Treatment of Nanocrystalline ZnO and AZO Films Grown by Pulsed Laser Deposition


1K. C. DUBEY, 2Dharmendra MISHRA, 1Anchal SRIVASTAVA and 1R. K. SHUKLA

1Department of Physics, University of Lucknow, Lucknow-226007, India

2Amity School of Engineering & Technology, Amity University, Lucknow-226010, India

Tel.: +91-9452293385

E-mail: krishnacdubey@rediffmail.com



Received: 27 January 2010   /Accepted: 19 February 2010   /Published: 26 February 2010


Abstract: Repeated heating and cooling of the pulsed laser as-deposited ZnO and Aluminium doped ZnO (AZO) films at temperatures below the deposition temperature modifies their structural, optical and electrical properties while maintaining the c-axis orientation. Heat treatment affects the AZO films only slightly and the minimum electrical resistivity occurs for 2at% Al doped film. The electrical resistivity of undoped ZnO film decreases by a factor of more than half after heating. Unlike as-deposited films the lattice constant decreases linearly with increased Al doping and the maximum grain size is observed at 2at% Al doping. Absorption edges of the heat treated films show a small red shift in comparison as-deposited films. Interestingly, for heat treated films minimum resistivity and the largest grain size both occur at 2at%Al doping in ZnO.


Keywords: Heat treatment, Undoped and doped ZnO, Transparent conducting oxide, Pulsed laser deposition


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