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Vol. 10, Special Issue, February 2011, pp.141-150

 

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Fabrication and Characterization of Ethanol Sensor Based on RF Sputtered ITO Films

 

aH. J. Pandya, b,*Sudhir Chandra and aA. L. Vyas

aInstrument Design Development Centre, Indian Institute of Technology Delhi,

bCentre for Applied Research in Electronics, Indian Institute of Technology Delhi,

Hauz Khas, New Delhi, 110016, India

Tel.: *+91-11-26591105, +91-11-26596209, fax: +91-11-26596219

E-mail: hjpele@yahoo.com, alvyas@iddc.iitd.ac.in, schandra@care.iitd.ernet.in

 

 

Received: 28 October 2010   /Accepted: 11 January 2011   /Published: 8 February 2011

 

Abstract: In the present work, we report the fabrication and testing of a sensor for the detection of ethanol vapours using RF magnetron sputter deposited ITO thin film on Si substrate. The principle of operation is the change of resistance of ITO film on exposure to ethanol vapours. The ITO films were prepared by RF magnetron sputtering process. The films were subsequently annealed at 450 C for 1h in air. The films were extensively characterized for their structural properties using XRD, SEM and TEM measurements. Two aluminium pads of 7 mm 4 mm size were formed using lift-off technique for electrical contacts and the sensing area was kept to be 3 mm 3 mm. The stability of the sensor in terms of its resistance with aging and temperature cycling was also investigated. The dynamic response of the sensor was evaluated using a simple test set-up. It is shown that sputtering parameters such as RF power strongly affect the sensitivity of detection.

 

Keywords: Indium tin oxide, RF sputtering, Ethanol sensor, VOC detection

 

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